高分布密度熔滴对ta-C薄膜力学性能的影响

    Effect of High Distribution Density Droplets on Mechanical Properties of ta-C Film

    • 摘要: 为研究高分布密度熔滴对ta-C薄膜力学性能和基体温度对熔滴分布密度的影响,分别用直接阴极电弧(DCVA)和磁过滤阴极电弧(FCVA)方法在不同基体温度下制备具有不同熔滴分布密度的ta-C薄膜。用扫描电子显微镜、3D光学轮廓仪、拉曼光谱仪、X射线光电子能谱、纳米压痕仪和球盘式摩擦磨损仪分别表征ta-C薄膜表面形貌、粗糙度、组织结构、纳米硬度和摩擦磨损性能。不加热基体时DCVA和FCVA制备的薄膜sp3C含量相近。结果表明:高分布密度熔滴降低薄膜摩擦系数、磨损率和硬度。基体温度升高对DCVA制备薄膜的熔滴分布密度无明显影响,但可使其摩擦系数降低,且磨损率仍低于FCVA制备薄膜的磨损率。

       

      Abstract: In order to study the effect of high distribution density droplets on the mechanical properties of ta-C film and substrate temperature on the distribution density of droplets, direct current vacuum cathodic arc(DCVA) and filtered vacuum cathodic arc(FCVA) were used to prepare ta-C films with different droplets distribution density under different substrate temperatures. The surface morphology, roughness, microstructure, nanohardness and tribological properties of ta-C films were characterized by scanning electron microscopy, 3D optical profilometer, Raman spectroscopy, X-ray photoelectron spectroscopy, nanoindenter and ball-on-disk tribometer respectively. The sp3C content of ta-C films prepared by DCVA and FCVA is similar while does not heat the substrate. The results show that the high distribution density of droplets reduces the friction coefficient, wear rate and hardness of ta-C films. The increase of substrate temperature has no significant influence on the distribution density of ta-C films prepared by DCVA, but reduces the friction coefficient of that, while the wear rate of that keeps lower than that of the films prepared by FCVA.

       

    /

    返回文章
    返回